The HHG, synchrotron, EUV-FEL and next generation lithography solution
Imagine Optic’s HASO EUV wavefront sensors offers professionals unsurpassed quality, precision and ease of use for ultra-short wavelength beam characterization, adjustment and alignment
- Working wavelength range from 4 to 45 nm, see the specification table below
- High resolution
- Large aperture
- Vacuum compatible
- Perfectly adapted for laboratory and industrial applications
- Independent phase and intensity measurements
- High-Numerical Aperture (NA) model now available
Examples of applications:
- HHG, synchrotron and EUV-FEL beam alignment and characterization
- Micro and nano-beam focusing, automatic beam alignment, and achieving high Strehl ratio for adaptive optics applications
- Mirror alignment in beamlines, Bender optimization to reach the best focal point size
- Beam stability characterization
- Schwarzschild telescope alignment and characterization
- Zoneplate characterization
- Plasma science
Imagine Optic’s HASO EUV wavefront sensor, developed in collaboration with the LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today’s demanding laboratory and industrial applications.
Designed and built in collaboration with our customers and with their needs as the top priority, the HASO EUV incorporates our patented rotated square technology to offer high spatial resolution and wide dynamic range, making it the ideal choice for HHG, EUV lithography, synchrotron and EUV-FEL beam analysis. When used for adaptive optics, the EUV becomes a powerful tool for that provides you with micro and nano-beam focusing, a high Strehl ratio and precise control of the focal spot shape.
When combined with our powerful and easy-to-use software packages, you can easily conduct wavefront acquisition and reconstruction. Additional add-on modules offer features including extended wavefront reconstruction and Point Spread Function (PSF), as well as a dynamic library that enables you to build your own software applications using this remarkable device.
|Description||HASO EUV||HASO EUV
|Aperture dimension||13 x 13 mm²||D=20 mm|
|Number of Subapertures||72 x 72||110 across diameter|
|Curvature dynamic range||0.5 m to ∞ (diverging)||0.1m m to ∞|
|Repeatability (rms)||λ/200||about λ/200|
|Wavefront measurement accuracy in relative mode (rms)1||about λ/150||< λ/100|
|Wavefront measurement accuracy in absolute mode (rms)²||λ/75@ 13.5nm||about λ/50 @ 30nm|
|Tilt measurement sensitivity (rms)||0.05 µrad||0.1 µrad|
|Spatial beam sampling step||about 180 µm||about 150 µm|
|Minimum readout time||about 600 ms (@2 MHz digitization)||about 2s|
|Working photon energy (wavelength)3||30 eV – 300 eV (4 nm – 40 nm)||27.6-124eV (10 nm – 45 nm)|
|Calibrated wavelength||user specific||user specific|
|Compliant vacuum (hydrocarbon free, compatible with clean vacuum)||10-7 mbar||up to 10-6 Torr*
* Requires dynamic vacuum
|Interface / Power supply||USB / included||USB / included|
|Operating system||Win 7 (x86 / x64)||Win 7 (x86 / x64)|
|WaveView metrology software||included||included|
|(1) Wavefront as seen by the device.
(2) Difference between the real wavefront and a reference wavefront obtained in similar conditions (5λ of shift max).
(3) Calibration ensured inside this range. Sensor may be used outside of this range.