X-EUV optical metrology

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Metrology and AO solutions for X-ray and EUV applications

Extreme UVs and X-Rays unlock access to an incomparable level of information. They are commonly used for research in physics, life sciences, and materials science. Light properties in this band of the spectrum require the use of very specific optics in very particular conditions. To achieve this, optical quality standards have been pushed to the limits of optical detection methods. Adaptive Optics (AO) is also a critical part of X-EUV sources, especially when requiring beam shaping for tight focusing and focal plane control.

Imagine Optic has been a part of a large number of projects including EUV X-RAY optical metrology and the production or transport of X–EUVs. Over the years, we have developed innovative solutions for at-wavelength wavefront sensing, active correction strategies, and optical metrology solutions dedicated to the metrology of X-rays and EUV beams and components. Based on this knowledge, Imagine Optic is now also contributing to the development of new imaging techniques, for applications ranging from EUV and X-Ray microscopy to radiography.

Application notes

Automatic & manual alignment of EUV
and X-ray optics

Unfolding the EUV
and X-ray source parameters

and FEL

Application notes