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HASO EUV

HHG, synchrotron, EUV-FEL, new generation lithography

HASO EUV

HHG, synchrotron, EUV-FEL, new generation lithography

The HASO EUV offers unsurpassed quality, precision and ease of use for ultra-short wavelength beam characterization, adjustment and alignment. Check out the HASOs Table to see our Full HASO SERIES, compare specs and choose what fits your requirements !!

HASO EUV Wavefront sensor

Ultra-short wavelength beam characterization and alignment

The HASO EUV  Wavefront Sensor offers unsurpassed quality, precision and ease of use for ultra-short wavelength beam characterization, adjustment and alignment.


HASO EUV is BEST FOR

+ HHG, synchrotron and EUV-FEL beam alignment and characterization
+ Mirror alignment in beamlines, Bender optimization
+ Stability characterization
+ Schwarzschild telescope alignment and characterization
+ Zoneplace characterization
+ Plasma science

 

Software

WAVEVIEW (included) is the most advanced wavefront measurement and analysis software including more than 150 features and tools optimized for a wide range of highly demanding applications.
+ Extensions for PSF, MTF, Strehl ratio, M-Squared parameter and Advanced Zernike (annular or elliptical)
+ Windows 11 and 10 compatible
WAVETUNE (optional) is a unique software that seamlessly combines wavefront measurement and correction features with extensive diagnostics.
It is perfectly adapted to our HASO and LIFT wavefront sensors, ILAO STAR, MIRAO and mu-DM deformable mirrors, as well as to a wide range of third-party phase correctors from the market.
WAVEKIT (optional) is a SDK (Software Development Kit) in C/C++, LabVIEW and Python, providing the basis blocks on which one can build a fully customized software for specific HASO based applications or WaveView data processing routines.
+ include documentation and examples
+ available on request.

 

Imagine Optic’s HASO EUV , developed in collaboration with LOA laboratory and the SOLEIL synchrotron, is the only device of its kind that offers you the extreme precision and direct measurement functionality needed for today’s most demanding laboratory and industrial applications.

Standard EUV

High NA EUV