The HHG, synchrotron, EUV-FEL and new generation lithography solution

Imagine Optic’s HASO EUV wavefront sensors offers professionals unsurpassed quality, precision and ease of use for ultra-short wavelength beam characterization, adjustment and alignment

Key features:

  • Working wavelength range from 4 to 45 nm, see the specification table below
  • High resolution
  • Large aperture
  • Vacuum compatible
  • Perfectly adapted for laboratory and industrial applications
  • Independent phase and intensity measurements
  • High-Numerical Aperture (NA) model now available

Examples of applications:

  • HHG, synchrotron and EUV-FEL beam alignment and characterization
  • Micro and nano-beam focusing, automatic beam alignment, and achieving high Strehl ratio for adaptive optics applications
  • Mirror alignment in beamlines, Bender optimization to reach the best focal point size
  • stability characterization
  • Schwarzschild telescope alignment and characterization
  • Zoneplate characterization
  • Plasma science

Imagine Optic’s HASO EUV wavefront sensor, developed in collaboration with the LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today’s demanding laboratory and industrial applications.

Designed and built in collaboration with our customers and with their needs as the top priority, the HASO EUV incorporates our patented rotated square technology to offer high spatial resolution and wide dynamic range, making it the ideal choice for HHG, EUV lithography, synchrotron and EUV-FEL beam analysis. When used for adaptive optics, the EUV becomes a powerful tool for that provides you with micro and nano-beam focusing, a high Strehl ratio and precise control of the focal spot shape.
When combined with our powerful and easy-to-use software packages, you can easily conduct wavefront acquisition and reconstruction. Additional add-on modules offer features including extended wavefront reconstruction and Point Spread Function (PSF), as well as a dynamic library that enables you to build your own software applications using this remarkable device.

Specifications

HASO EUV

Description HASO EUV HASO EUV

High NA

Aperture dimension 13 x 13 mm² D=20 mm
Number of Subapertures 72 x 72 110 across diameter
Curvature dynamic range 0.5 m to ∞ (diverging) 0.1m m to ∞
Repeatability (rms) about λ/200 about λ/200
Wavefront measurement accuracy in relative mode (rms)1 about λ/100 < λ/100
Wavefront measurement accuracy in absolute mode (rms)² λ/50 @ 13.5nm about λ/50 @ 30nm
Tilt measurement sensitivity (rms) 0.05 µrad 0.1 µrad
Spatial beam sampling step about 180 µm about 150 µm
Minimum readout time about 600 ms (@2 MHz digitization) about 2s
Working photon energy (wavelength)3 30 eV – 300 eV (4 nm – 40 nm) 27.6-124eV (10 nm – 45 nm)
Calibrated wavelength user specific user specific
Length 270 mm 170mm
Compliant vacuum (hydrocarbon free, compatible with clean vacuum) 10-7 mbar up to 10-6 Torr*
* Requires dynamic vacuum
Interface / Power supply USB / included USB / included
Operating system Win 7 (x86 / x64) Win 7 (x86 / x64)
WaveView metrology software included included
External trigger Possible Possible
(1) Wavefront as seen by the device.

(2) Difference between the real wavefront and a reference wavefront obtained in similar conditions (5λ of shift max).

(3) Calibration ensured inside this range. Sensor may be used outside of this range.

Downloads

Service Documents

HASO EUV | Specification sheet

High harmonic generation

High harmonic generation | Application note: Optimization of HHG

Publication list | X-EUV