Total precision wavefront characterization of miniature optics and objectives that allows you to measure aberrations, back focal length (BFL), effective focal length (EFL), chromatism, field curvature, distortion, vignetting, and relative illumination as a function of the field calculate the 3D MTF and the MTF through-focus for all measured points in the field as well as to determine the best focal plane.
- fully automated
- compact, space saving design
- precision wavefront characterization
- complete optical characterization
 The SL-Sys™ neo is a unique lens characterization solution designed for industrial R&D programs and for production line quality control. Based on Imagine Optic’s industry leading HASO™ wavefront sensor technology, the SL-Sys neo is the only commercially available system that enables you to completely characterize convergent (positive power) optical components 1.5-12 mm* in diameter of any numerical aperture over the entire field of view.
One of the many advantages of the SL-Sys neo is its ability to precisely measure the optical element’s aberrations as wavefront errors over the entire field of view and/or at any point therein. Contrary to systems that only provide simple Modulation Transfer Function (MTF) data, the precision wavefront data furnished by the SL-Sys neo enables you to move beyond rudimentary good/bad evaluation and into the domain of complete optical component analysis in order to identify the problem’s source.
 In addition to wavefront aberrations, only the SL-Sys neo offers a 3-dimensional MTF measurement on all of the azimuths simultaneously. For the first time, you not only have access to the standard tangential and sagittal MTF curves on a single point, but equally to every other azimuth of the measured field in addition to the averaged MTF of all azimuths.
Lenses or objectives are easily loaded into the SL-Sys neo and users characterize the element via a fully-automated Windows XP interface that provides instant access to a host of valuable data.
The SL-Sys neo ensures precision measurements in part thanks to the meticulous optical conjugation between the wavefront sensor’s measurement plane and the measured element’s pupil. Its space-saving vertical design houses a dual wavelength HASO wavefront sensor functioning at 532 and 635 nm, and with microlens array resolutions’ of either 32x40 (SL-Sys – neo 32) or 76x100 (SL-Sys – neo 76). Key measurement characteristics include:
- ±45° field angle
- λ/100 aberration measurement sensitivity
- better than 0.005 MTF measurement sensitivity
- 1000 lp/mm maximum MTF frequency acquisition (automatically adjusted)
- better than 0.5% focal measurement sensitivity
In the lab or on the production floor, the data you receive enables you to act quickly and decisively to enhance designs or correct problems.
If you would like more information on the SL-Sys neo, please call +33 (0)1 64 86 15 60 or e-mail us by clicking here.
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