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Imagine
Optic's HASO X-EUV wavefront sensor, developed
in partnership with LOA and the SOLEIL synchrotron,
is the only device of its kind available that
offers you the extreme precision and direct measurement
functionality needed for today'wws demanding laboratory
and industrial
applications.
- Synchrotron and X-fel beam alignment and characterization
- Micro and nano-beam focusing, automatic beam alignment, and high Strehl ratio for adaptive optics
- Perfectly adapted for laboratory applications
- Independent phase and intensity measurement
Designed and built in collaboration with our customers and with their needs as the top priority, the HASO X-EUV incorporates our patented rotated square technology to offer high spatial resolution and wide dynamic range, making it the ideal choice for EUV lithography, synchrotron and X-fel beam analysis. When used for adaptive optics, the X-EUV becomes a powerful tool for that provides you with micro and nano-beam focusing, a high Strehl ratio and precise control of the focal spot shape.
When combined with our powerful and easy-to-use software packages, you can easily conduct wavefront acquisition and reconstruction. Additional add-on modules offer features including extended wavefront reconstruction, PSF and MTF measurement, as well as a dynamic library that enables you to build your own software applications using this remarkable device.
Applications include ultra short wavelength beam characterization, adjustment and alignment; adaptive optics and automatic beam alignment; and EUV lithography.
If you would like more information on our products, please call +33 (0)1 64 86 15 60 or e-mail us at  |
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| Aperture dimension |
20 x 20 mm² |
10 x 10 mm² |
| Number of sub-aperture dedicated for analisys |
51 x 51 |
75 x 75 |
| Curvature dynamic range |
± 0.5 m to ± ∞ |
0.4 to 4 m – divergent beam |
| Repeatability (rms) |
~ λ/100 |
~ λ/10 |
| Wavefront measurement accuracy in absolute mode (rms) |
~ λ/50 |
~ λ/5 |
| Wavefront measurement accuracy in relative mode (rms) |
~ λ/75 |
~ λ/4 |
| Tilt measurement accuracy (rms) |
0.05 µrad |
0.05 µrad |
| Focus measurement accuracy (rms) |
< 1.10-4 m-1 |
| Spatial beam sampling step |
~ 390 µm |
~ 130 µm |
| Minimum readout time |
~2 sec ( @1 MHz digizitation ) |
~0.6 sec ( @2 MHz digizitation ) |
| Working photon energy (wavelength) (1) |
50 eV - 200 eV (7 nm - 25 nm) |
1 keV – 4 keV (1 nm – 0.3 nm) |
| Storage temperature / Operating environment |
< 55°C / 5°C – 30°C |
Compliant vacuum (hydrocarbon free
compatible with clean vacuum) |
10-6 mbar |
| Power supply |
Via controller (100-110-220 or 240V AC) |
| Communication interface |
PCI board |
| (1) HASO X-EUV wavefront sensors can be optimized for other wavelength ranges. Contact Imagine Optic for more details. |
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