| Functioning between 193 and 300nm, our HASO™ UV helps manage costs and improve productivity by optimizing the alignment of the focusing devices used in nanolithography. With our HASO HP-GE, you can reliably characterize optics at the subnanometric scale to ensure the quality of stepper and X optics whereas our newest product, e-Xplorer™, enables users to measure and characterize the planeness of semiconductor wafers.
If you would like more information on our products, please call +33 (0)1 64 86 15 60 or e-mail us by clicking here.
Wavefront measurement and analysis
- HASO
UV -excellent precision for wavefront metrology
in the UV spectrum.
- HASO
HP 26-GE -enables you to measure with l/1000 precision.
- HASO
X-EUV -provides a unique tool for measuring wavefront
in the spectral range from 1 to 20 nm.
Software
- HASO
v3 - the latest release of our flagship wavefront
measurement and analysis software offers a wide array
of standard features to make working with your HASO
wavefront sensors easy.
Solutions
- e-Xplorer™ - provides precision measurement and characterization
of wafer form from 4-6 inches.
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